Faculty Information - INOUE Yasushi

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Academic background

Present specialized field

E-Mail Address

Research activities

Works

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（Last updated : 2025-03-24 13:43:00）

INOUE Yasushi
Department of Advanced Materials Science and Engineering, Faculty of Engineering

Graduate School of Engineering

Master's Program in Advanced Materials Science and Engineering, Graduate School of Engineering

Professor

■ Office

Tsudanuma Campus, No.2 Building,5th floor room 010508

■ Academic background

〔Doctorial Course〕, Nagoya University, Completed, Doctor of Engineering

■ Present specialized field

Inorganic materials and properties, Thin film/surface and interfacial physical properties, Fundamental plasma, Environmental materials and recycle technology

■ E-Mail Address

■ Research activities

1.	2013/10～	Materials Science Society of Japan
2.	2016/04～2017/04	∟ Councilor
3.	2017/04～	∟ Director
4.	2011/01	The Iron and Steel Institute of Japan
5.	2004/04～	The Vacuum Society of Japan
6.	2012/04～2014/03	∟ Director
7.	1995/02～	The Japan Society of Applied Physics
8.	1994/04～	The Japan Institute of Metals and Materials
9.	1993/07～	The Surface Finishing Society of Japan
10.	2017/04～	∟ Director
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■ Works

1.	Article	Quantitative Evaluation on Color Change and Surface Area in Adsorption-induced Electrochromic Phenomenon pp.205-210 (Collaboration) 2017/12
2.	Article	Influence of Substrate Materials on Deposition of Plasma-polymerized SiO:CH Particles Journal of Photopolymer Science and Technology 30(3),pp.337-340 (Collaboration) 2017/08
3.	Article	Electrochromic Color-change Durability of Microvillus-structured InN Films Journal of the Surface Finishing Society of Japan pp.370-374 (Collaboration) 2016/07
4.	Article	Electrochromic Phenomenon of Indium Nitride Films in Non-aqueous Solution IEICE technical report pp.7-10 (Collaboration) 2016/01
5.	Article	A Study on Electron Impact Dissociative Ionization of Organosilicon Precursors for Plasma Processing Journal of Nanoscience and Nanotechnology 14(12),pp.9653-9656 (Collaboration) 2014/12
6.	Article	Preparation of environment-conscious advanced functional thin films pp.17-24 (Collaboration) 2014/01
7.	Article	Electrochromic phenomenon in indium-tin oxide thin films deposited by RF magnetron sputtering Thin Solid Films 518(21),pp.S6-S9 (Collaboration) 2010/08
8.	Article	Electrochromic Properties of InN:Sn Films Deposited by Reactive Evaporation Thin Solid Films 518(3),pp.1001-1005 (Collaboration) 2009/12
9.	Article	Influence of Ar gas flow rate in organosilicon plasma for the fabrication of SiO:CH thin films by PECVD method Surface and Coatings Technology 202,pp.5259-5261 (Collaboration) 2008/08
10.	Article	Radio frequency power dependence in formation of SiO:CH thin films by plasma-enhanced chemical vapor deposition Japanese Journal of Applied Physics 46(11),pp.7460-7464 (Collaboration) 2007/11
11.	Article	Behavior of Various Organosilicon Molecules in PECVD Processes for Hydrocarbon-doped Silicon Oxide Films Solid State Phenomena 124-126,pp.347-350 (Collaboration) 2007/06
12.	Article	Biomimetic Improvement of Electrochromic Properties of Indium Nitride Journal of the Electrochemical Society 154(7),pp.J212-J216 (Collaboration) 2007/05
13.	Article	Patterned hydrophobic-hydrophilic templates made from microwave-plasma enhanced chemical vapor deposited thin films Thin Solid Films 515(9),pp.4203-4208 (Collaboration) 2007/03
14.	Article	Fabrication and characterization of ultra-water-repellent alumina-silica composite films Journal of Physics D: Applied Physics 40(1),pp.192-197 (Collaboration) 2007/01
15.	Article	Water droplets interaction with super-hydrophobic surfaces Surface Science 600(18),pp.3710-3714 (Collaboration) 2006/09
16.	Article	Ultrahydrophobic/ultrahydrophilic micropatterning on a polymeric substrate Chemical Vapor Deposition 11(8-9),pp.347-349 (Collaboration) 2005/09
17.	Article	Transparent ultra water-repellent poly(ethylene terephthalate) substrates fabricated by oxygen plasma treatment and subsequent hydrophobic coating Applied Surface Science 244(1-4),pp.619-622 (Collaboration) 2005/05
18.	Article	Amorphous carbon and carbon nitride multilayered films prepared by shielded arc ion plating Thin Solid Films 475(1-2),pp.308-312 (Collaboration) 2005/03
19.	Article	Wettability of poly(ethylene terephthalate) substrates modified by a two-step plasma process: Ultra water-repellent surface fabrication Chemical Vapor Deposition 10(6),pp.295-297 (Collaboration) 2004/12
20.	Article	Organosilane self-assembled monolayers directly linked to the diamond surfaces Journal of Vacuum Science and Technology 22,pp.2005-2009 (Collaboration) 2004/09
21.	Article	Contribution of Primary Chemical Bonding States of Amorphous Carbon Nitride to Hardness Electrochemical and Solid-State Latters 7(8),pp.C84-C86 (Collaboration) 2004/08
22.	Article	Mechanical durability of ultra-water-repellent thin film by microwave plasma-enhanced CVD Thin Solid Films 457(1),pp.122-127 (Collaboration) 2004/06
23.	Article	UV Raman Spectroscopic Probing into Nitrogen-doped Hydrogenated Amorphous Carbon Thin Solid Films 457(1),pp.128-132 (Collaboration) 2004/06
24.	Article	Dependence of hybridizations analyzed by XPS and visible Raman spectroscopy on nanohardness and wear resistance of amorphous carbon carbon nitride films Diamond Rel. Mater. 13,pp.507-512 (Collaboration) 2004
25.	Article	Characteristics and high water-repellency of a-C : H films deposited by r.f. PECVD Surf. Coat. Technol. 162(2-3),pp.135-139 (Collaboration) 2003
26.	Article	Correlation between wear-resistance and chemical structure of CNx films synthesized by shielded arc ion plating Surf. Coat. Technol. 169,pp.336-339 (Collaboration) 2003
27.	Article	Gas barrier performance of surface-modified silica films with grafted organosilane molecules Langmuir 19(20),pp.8331-8334 (Collaboration) 2003
28.	Article	Nano- and Micro-tribological Characteristics of Amorphous Carbon Films Prepared by Shielded Arc Ion Plating Thin Solid Films 435(1-2),pp.150-153 (Collaboration) 2003
29.	Article	Nanotextures fabricated by microwave plasma CVD: application to ultra water-repellent surface Surf. Coat. Technol. 174,pp.867-871 (Collaboration) 2003
30.	Article	Origin of N 1s spectrum in amorphous carbon nitride obtained by X-ray photoelectron spectroscopy Thin Solid Films 434(1-2),pp.296-302 (Collaboration) 2003
31.	Article	Preparation of hard and ultra water-repellent silicon oxide films by microwave plasma-enhanced CVD at low substrate temperatures Thin Solid Films 435(1-2),pp.161-164 (Collaboration) 2003
32.	Article	Synthesis of silica films on a polymeric material by plasma-enhanced CVD using tetramethoxysilane Surf. Coat. Technol. 169,pp.583-586 (Collaboration) 2003
33.	Article	Ultra-water-repellent poly(ethylene terephthalate) substrates Langmuir 19(25),pp.10624-10627 (Collaboration) 2003
34.	Article	Characteristics of ultra water-repellent thin films prepared by combined process of microwave plasma-enhanced CVD and oxygen-plasma treatment Thin Solid Films 407(1-2),pp.45-49 (Collaboration) 2002
35.	Article	Gas barrier properties of silicon oxide films prepared by plasma-enhanced CVD using tetramethoxysilane Vacuum 66(3-4),pp.353-357 (Collaboration) 2002
36.	Article	Growth and structure of silica films deposited on a polymeric material by plasma-enhanced chemical vapor deposition Thin Solid Films 420,pp.324-329 (Collaboration) 2002
37.	Article	Magnesium plasma immersion ion implantation in a large straight magnetic duct Plasma Sources Sci. Technol. 11(3),pp.317-323 (Collaboration) 2002
38.	Article	Thin films with nanotextures for transparent and ultra water-repellent coatings produced from trimethylmethoxysilane by microwave plasma CVD Chem. Vapor Depos. 8(2),pp.47-50 (Collaboration) 2002
39.	Article	Transparent silica films deposited by low-temperature plasma-enhanced CVD using hexamethyldisiloxane Chemical Vapor Deposition 8(6),pp.251-253 (Collaboration) 2002
40.	Article	In situ surface analysis by infrared reflection absorption spectroscopy in PECVD of silicon-oxide films Thin Solid Films 386(2),pp.252-255 (Collaboration) 2001
41.	Article	Reduction of carbon impurities in silicon oxide films prepared by RF plasma-enhanced CVD Thin Solid Films 390(1-2),pp.88-92 (Collaboration) 2001
42.	Article	Room-temperature deposition of high-purity silicon oxide films by RF plasma-enhanced CVD Surf. Coat. Technol. 146,pp.451-456 (Collaboration) 2001
43.	Article	Electrochromic Reaction of InN Thin Films J. Electrochem.Soc. 146(6),pp.2365-2369 (Collaboration) 1999
44.	Article	In situ Observation of Behavior of Organosilicon Molecules in Low-temperature Plasma Enhanced CVD Thin Solid Films 345(1),pp.90-93 (Collaboration) 1999
45.	Article	Properties of Silicon Oxide Films Deposited by Plasma-enhanced CVD Using Organosilicon Reactants and Mass Analysis in Plasma Thin Solid Films 341(1-2),pp.47-51 (Collaboration) 1999
46.	Article	Growth and Nanostructure of InN Thin Films Deposited by Reactive Magnetron Sputtering Thin Solid Films 318(1-2),pp.148-150 (Collaboration) 1998
47.	Article	Mass Spectroscopy in Plasma-enhanced Chemical Vapor Deposition of Silicon-oxide Films Using Tetramethoxysilane Thin Solid Films 316(1-2),pp.79-84 (Collaboration) 1998
48.	Article	Optical and Electrical Properties of InN Thin Films Grown on ZnO/a-Al2O3 by RF Reactive Magnetron Sputtering Thin Solid Films 334(1-2),pp.49-53 (Collaboration) 1998
49.	Article	Physical Prooperties of Reactive Sputtered Tin-Nitride Thin Films Vacuum 51(4),pp.673-676 (Collaboration) 1998
50.	Article	Structural and Electrochromic Properties of InN Thin Films Thin Solid Films 332(1-2),pp.267-271 (Collaboration) 1998
51.	Article	Synthesis of Sn-doped a-C:H Films by RF Plasma-enhanced CVD and Their Characterization Thin Solid Films 322(1-2),pp.41-45 (Collaboration) 1998
52.	Article	Spectroscopic Studies on Preparation of Silicon Oxide Films by PECVD Using Organosilicon Compounds Plasma Sources Sci. Technol. 5(2),pp.339-343 (Collaboration) 1996
53.	Article	Computer Simulations on the Electrical Resistivities of Metallic Superlattice based on Simple Model J. Mag. Mag. Matt. 126,pp.475-478 (Collaboration) 1993
54.	Article	Fundamental Processes of the Epitaxial Growth of Silver and Gold Films Appl. Surf. Sci. 60/61,pp.667-671 (Collaboration) 1992
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■ Home Page

http://home.att.ne.jp/surf/isil/ys/