ヤマウチ ヒロシ
Yamauchi Hiroshi
山内 博 所属 千葉工業大学 工学部 宇宙・半導体工学科 職種 准教授 |
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言語種別 | 英語 |
発行・発表の年月 | 2009/04 |
形態種別 | 学術雑誌 |
査読 | 査読あり |
標題 | Fabrication of Active Light-Emitting Device Combined with ZnO Transistors |
執筆形態 | 共著 |
掲載誌名 | JAPANESE JOURNAL OF APPLIED PHYSICS |
掲載区分 | 国内 |
出版社・発行元 | JAPAN SOCIETY APPLIED PHYSICS |
巻・号・頁 | 48(4) |
著者・共著者 | H. Yamauchi,Y. Watanabe,M. Iizuka,M. Nakamura,and K. Kudo |
概要 | Organic light-emitting diodes (OLEDs) have received much attention owing to their flexibility, low cost, and ease of processing. Although the active matrix display is a suitable system for what transistors and OLEDs with a large aperture ratio should be fabricated in each pixel. In this work, as one of the methods of expanding effective light-emitting area for active matrix displays, a new type of active light-emitting device combined with a ZnO transistor is proposed. The low-temperature, low-damage sputtering method improves on current by two orders of magnitude. A luminance of the active light-emitting device driven by ZnO transparent field-effect transistor (FET) was obtained. We fabricated a device with ZnO transparent FET and reported the electrical properties of ZnO FET. (C) 2009 The Japan Society of Applied Physics |
DOI | 10.1143/JJAP.48.04C167 |
ISSN | 0021-4922 |