クマタニ　アキチカ   Akichika Kumatani   熊谷　明哉    所属   千葉工業大学  工学部 電気電子工学科    千葉工業大学  工学研究科 工学専攻    職種   教授
言語種別	英語
発行・発表の年月	2014/05
形態種別	学術雑誌
標題	Epitaxial growth of Li4Ti5O12 thin films using RF magnetron sputtering
執筆形態	共著
掲載誌名	Japanese Journal of Applied Physics
掲載区分	国外
出版社・発行元	The Japan Society of Applied Physics
巻・号・頁	53(5)
担当区分	筆頭著者
著者・共著者	Akichika Kumatani,Susumu Shiraki,Yoshitaka Takagi,Tohru Suzuki,Takeo Ohsawa,Xiang Gao,Yuichi Ikuhara,Taro Hitosugi
概要	We fabricated Li4Ti5O12(111) epitaxial thin films on alpha-Al2O3(0001) substrates by RF magnetron sputtering. Thin films of amorphous Li4Ti5O12 were deposited at room temperature, and then the films were annealed at high temperatures for the formation of epitaxial thin films. Furthermore, we investigated the effect of niobium (Nb) incorporation into Li4Ti5O12. The Nb-incorporated Li4Ti5O12 thin films showed an improvement in crystallinity with a narrower rocking curve full width at half-maximum of 0.36 degrees for the Li4Ti5O12(111) peak. Further, the resistivity of the Nb-incorporated film dropped three orders of magnitude on the Nb incorporation. (C) 2014 The Japan Society of Applied Physics
DOI	10.7567/JJAP.53.058001
ISSN	0021-4922/1347-4065
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