クマタニ　アキチカ   Akichika Kumatani   熊谷　明哉    所属   千葉工業大学  工学部 電気電子工学科    千葉工業大学  工学研究科 工学専攻    職種   教授
言語種別	英語
発行・発表の年月	2012/01
形態種別	学術雑誌
標題	Reduction of charge injection barrier by 1-nm contact oxide interlayer in organic field effect transistors
執筆形態	共著
掲載誌名	Applied Physics Letters
掲載区分	国外
出版社・発行元	American Institute of Physics
巻・号・頁	100(1)
著者・共著者	Peter Darmawan,Takeo Minari,Akichika Kumatani,Yun Li,Chuan Liu,Kazuhito Tsukagoshi
概要	The enhancement of the charge injection process by the insertion of an ultrathin (similar to 1 nm) contact oxide interlayer (COI) at the metal/organic material interface in organic field effect transistors (OFETs) is reported. Six different oxides were used as COI, and Al(2)O(3) was found to exhibit the highest OFET mobility with a reduction in the average contact resistance (R(c)) from 19.9 to 1.9 k Omega.cm. Photoelectron yield spectroscopy analysis revealed that the insertion of COI increases the work function of an Au contact and reduces the charge injection barrier at the interface, which lowers R(c) and, therefore, results in enhanced device performance. (C) 2012 American Institute of Physics. [doi:10.1063/1.3673842]
DOI	10.1063/1.3673842
ISSN	0003-6951/1077-3118
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